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hkt's bookmarks matching tag lithography
 
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Comprehensive defect analysis methodology for nano imprint lithography
T. DiBiase, M. Ahamdian, and I. Malik
Microelectronic Engineering 84 (5-8), 989-93 (2007)
Posted by hkt to Molecular imprints Nano imprint nil lithography Defects Template on Tue Aug 07 2007 at 18:05 UTC | info | related
 
Simulation of critical dimension and profile metrology based on scatterometry method
info:doi/10.1117/12.688623
Compilation and indexing terms, Copyright 2006 Elsevier Inc. All rights reserved; T3: Proceedings of SPIE - The International Society for Optical Engineering
Posted by hkt to Nondestructive examination Electromagnetic wave scattering Maxwell equations phase shift AMPLITUDE MODULATION measurement theory lithography Spectrum Analysis polarization Computer Simulation on Tue Aug 07 2007 at 18:01 UTC | info | related
 
Fabrication of 10 nm enclosed nanofluidic channels
Han Cao et al.
Applied Physics Letters 81 (1), 174-6 (2002)
Posted by hkt to molecular biophysics lithography microfluidics nanotechnology on Tue Aug 07 2007 at 18:01 UTC | info | related
 
Polymer bonding process for nanolithography
T. Borzenko et al.
Applied Physics Letters 79 (14), 2246-8 (2001)
Posted by hkt to glass transition heat treatment Surface treatment polymer films lithography Polymers adhesion nanotechnology on Tue Aug 07 2007 at 17:58 UTC | info | related
 
Fully integrated optical system for lab-on-a-chip applications
info:doi/10.1109/mems.2004.1290529
Compilation and indexing terms, Copyright 2006 Elsevier Inc. All rights reserved; T3: Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Posted by hkt to Polymethyl methacrylates Ultraviolet radiation Photodetectors Dye lasers Microprocessor chips Optical systems waveguides Adhesives bonding Substrates lithography glass on Tue Aug 07 2007 at 17:53 UTC | info | related
 
Step and flash imprint lithography: Template surface treatment and defect analysis
T. Bailey et al.
Posted by hkt to surface contamination surface cleaning Surface treatment lithography on Tue Aug 07 2007 at 17:53 UTC | info | related
 
Manufacturing considerations for implementation of scatterometry for process monitoring
info:doi/10.1117/12.386465
Compilation and indexing terms, Copyright 2006 Elsevier Inc. All rights reserved; T3: Proceedings of SPIE - The International Society for Optical Engineering
Posted by hkt to Spectroscopic analysis Process control optical microscopy atomic force microscopy scanning electron microscopy lithography on Tue Aug 07 2007 at 17:49 UTC | info | related

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