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Pattern based prediction for plasma etch
Pattern Based Prediction for Plasma Etch
info:doi/10.1109/asmc.2006.1638727
Compilation and indexing terms, Copyright 2006 Elsevier Inc. All rights reserved; T3: ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
Posted by hkt to Semiconductor device manufacture Integrated circuit layout Plasma etching pattern matching on Tue Aug 07 2007 at 17:49 UTC | info | related

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