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Simulation of critical dimension and profile metrology based on scatterometry method
info:doi/10.1117/12.688623
Compilation and indexing terms, Copyright 2006 Elsevier Inc. All rights reserved; T3: Proceedings of SPIE - The International Society for Optical Engineering
Posted by hkt to Nondestructive examination Electromagnetic wave scattering Maxwell equations phase shift AMPLITUDE MODULATION measurement theory lithography Spectrum Analysis polarization Computer Simulation on Tue Aug 07 2007 at 18:01 UTC | info | related

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