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We present experiments on a superconductor–normal-metal electron refrigerator in a regime where single-electron charging effects are significant. The system functions as a heat transistor; i.e., the heat flux out from the normal-metal island can be controlled with a gate voltage. A theoretical model developed within the framework of single-electron tunneling provides a full quantitative agreement with the experiment. This work serves as the first experimental observation of Coulombic control of heat transfer and, in particular, of refrigeration in a mesoscopic system.

The metal oxide semiconductor field effect transistor (MOSFET) is scaling to a “tunneling epoch”, in which multiple leakage current induced by different tunneling effects exist. The complementary Si-based tunneling transistors are presented in this paper. The working principle of this device is investigated in detail. It is found that the band-to-band tunneling current is be controlled by the gate-to-source voltage. Due to the reverse biased p-i-n diode structure, an ultra-low leakage current is achieved. The sub-threshold swing of TFET is not limited by kt/q, which is the physical limit of the MOSFET. Using the CMOS compatible processes, the complementary TFETs (CTFET) are fabricated on one wafer. From a circuit point of view, the compatibility between TFET and MOSFET enables the transfer of CMOS circuits to CTFET circuits.

We have demonstrated a 70-nm n-channel tunneling field-effect transistor (TFET) which has a subthreshold swing (SS) of 52.8 mV/dec at room temperature. It is the first experimental result that shows a sub-60-mV/dec SS in the silicon-based TFETs. Based on simulation results, the gate oxide and silicon-on-insulator layer thicknesses were scaled down to 2 and 70 nm, respectively. However, the ON/ OFF current ratio of the TFET was still lower than that of the MOSFET. In order to increase the on current further, the following approaches can be considered: reduction of effective gate oxide thickness, increase in the steepness of the gradient of the source to channel doping profile, and utilization of a lower bandgap channel material

Power dissipation has become a major obstacle in performance scaling of modern integrated circuits and has spurred the search for devices operating at lower voltage swing. In this letter, we study p-i-n band-to-band tunneling field effect transistors taking semiconducting carbon nanotubes as the channel material. The on current of these devices is mainly limited by the tunneling barrier properties, and phonon-scattering has only a moderate effect. We show, however, that the off current is limite...

We demonstrate the efficacy of diblock copolymer self assembly for solving key fabrication challenges of aggressively scaled silicon field effect transistors. These materials spontaneously form nanometer-scale patterns that self-align to larger-scale lithography, enabling construction of sub-lithographic semiconducting transistor channels composed of arrays of parallel nanowires with critical dimensions (15 nm width, 40 nm pitch) defined by self assembly. The number of nanowires in the arrays is...

Quench-condensed bismuth films of 3-5 nm thickness have been used as a cluster source to prepare Single Electron Transistors (SET) based on a single cluster with high charging energy. We used electron-beam defined shadow evaporation masks to pattern la nm wide constrictions in these films. By incremental depositions through these masks controlled by in situ sample conductance measurements, we obtained a SET geometry for clusters with, charging energies up to 90 meV Our experiment showed that the SET geometry can be achieved in every sample preparation ran, despite the apparent random nature of cluster formation in granular films. The resulting charging energy of the transistor varied from experiment to experiment. As value, however, was always higher than 10 meV.