Characterisation of the plasma plume induced by femtosecond laser-metal interactions has been carried out using a Langmuir probe. A double peak distribution of ablated ions and electrons has been recorded during time of flight (TOF) experiments for three metals studied (Ag, Cu and Ni). The first peak which occurs earliest in time is attributed to a surface layer of contaminants on the metal surface as it is shown to disappear after several laser shots. The re-growth of this peak, thought to be due to a recontamination process on the surface of the metal, is the subject of this paper. Two re-contamination mechanisms were considered; adsorption of contaminants from the ambient gas, and surface diffusion effects from the surrounding contaminants. Re-contamination rates for Ag, Cu and Ni were studied under two distinct gas pressures to investigate the contamination effects from the ambient. Effects arising from surface diffusion were investigated by raising the temperature of the metal sample to increase the surface mobility of the contaminants. The total contribution of contamination species present in the ablation plume was estimated by conducting angular distribution measurements of the plume. Surface diffusion of the surrounding contaminants was found to be the dominant recontamination process.

The article discusses the advantages of ion mobility advantages (IMS) technology in the monitoring of molecular contamination in lithography. It was stressed that advances in IMS allow small, low-cost monitors that have excellent sensitivity and stability. The significance of the technology in a conventional multipoint sampling system includes continuous monitoring of a single sample point, no sampling interruptions or missed contamination events and higher sensitivity to contaminants.